Electron Beam Lithography at the Rutherford Laboratory
R.A. Lawes
(Science Research Council, Rutherford Laboratory, Chilton, OXON.)
36
Abstract
The Science Research Council has opened a mask‐making facility at the Rutherford Laboratory based on the EBMF‐2 Electron Beam Microfabricator. Ancillary equipment designed to support the EBM resolves features down to 1 micron or below. The paper discusses the principles, design parameters and the performance of the EBM and outlines mask manufacturing procedure.
Citation
Lawes, R.A. (1981), "Electron Beam Lithography at the Rutherford Laboratory", Circuit World, Vol. 7 No. 3, pp. 60-63. https://doi.org/10.1108/eb043644
Publisher
:MCB UP Ltd
Copyright © 1981, MCB UP Limited