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Surface Modification of Nomex Fabric by a 172 nm Xe2 * Excimer UV Lamp

Jing Xie (Key Laboratory of Science &Technology of Eco-Textile (Donghua University), Ministry of Education, Shanghai 201620, China )
Mei Yang (Key Laboratory of Science &Technology of Eco-Textile (Donghua University), Ministry of Education, Shanghai 201620, China )
Kelu Yan (Key Laboratory of Science &Technology of Eco-Textile (Donghua University), Ministry of Education, Shanghai 201620, China )
Ping Yao (Key Laboratory of Science &Technology of Eco-Textile (Donghua University), Ministry of Education, Shanghai 201620, China )

Research Journal of Textile and Apparel

ISSN: 1560-6074

Article publication date: 1 May 2010

131

Abstract

Nomex fabric is irradiated by an Xe2 * excimer UV lamp (172 nm). The influence of different irradiating times and atmospheres (nitrogen and air) on the properties of Nomex fabric has been studied. The results show that the wettability of Nomex fabrics greatly improves when irradiated for 2 minutes. The scanning electron microscope (SEM) photos denote that the surface of the irradiated Nomex fiber is etched and the degree of etching in nitrogen is more severe than that in air. The XPS measurement proves that the surface of the Nomex fibers, which is irradiated in nitrogen and in air, generates carboxyl and hydroxyl groups. The results also show that the adhesive strength of the Nomex/polyethylene composite is reinforced by the irradiation.

Keywords

Citation

Xie, J., Yang, M., Yan, K. and Yao, P. (2010), "Surface Modification of Nomex Fabric by a 172 nm Xe2 * Excimer UV Lamp", Research Journal of Textile and Apparel, Vol. 14 No. 2, pp. 38-44. https://doi.org/10.1108/RJTA-14-02-2010-B005

Publisher

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Emerald Group Publishing Limited

Copyright © 2010 Emerald Group Publishing Limited

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