Control characteristics: a case study on semiconductor manufacturing
Abstract
Purpose
This paper aims to clarify adequate control characteristics for using a control chart on the basis of a case study of the low‐pressure chemical vapor deposition (LPCVD) process, which is one of the semiconductor manufacturing processes.
Design/methodology/approach
The paper opted for a simulation study using the data generated by EWMA model and the real data obtained from the LPCVD process.
Findings
The paper provides adequate control characteristics for control charts. It suggests that it is desirable to employ both the quality characteristic and the process rate for monitoring when the process was modeled by the EWMA model. Furthermore, if only one control characteristic is employed, then the process rate is the most adequate characteristic.
Originality/value
This paper newly proposes the process rate as a control characteristic for control charts.
Keywords
Citation
Kawamura, H., Nishina, K., Higashide, M. and Suzuki, T. (2012), "Control characteristics: a case study on semiconductor manufacturing", Asian Journal on Quality, Vol. 13 No. 1, pp. 37-52. https://doi.org/10.1108/15982681211237815
Publisher
:Emerald Group Publishing Limited
Copyright © 2012, Emerald Group Publishing Limited