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Process planning method for mask projection micro‐stereolithography

A.S. Limaye (George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, Georgia, USA)
D.W. Rosen (George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, Georgia, USA)

Rapid Prototyping Journal

ISSN: 1355-2546

Article publication date: 3 April 2007

1777

Abstract

Purpose

Mask projection micro‐stereolithography (MPμSLA) is an additive manufacturing process capable for fabricating true three‐dimensional microparts and hence, holds promise as a potential 3D MEMS fabrication process. With only a few MPμSLA systems developed and studied so far, the research in this field is inchoate and experimental in nature. In order to employ the MPμSLA technology for microfabrication, it is necessary to model its part building process and formulate a process planning method to cure dimensionally accurate microparts. The purpose of this paper is to formulate a process planning method for curing dimensionally accurate layers.

Design/methodology/approach

A MPμSLA system is designed and assembled. The process of curing a single layer in resin using this system is modeled as the layer cure model. The layer cure model is validated by curing test layers. This model is used to formulate a process planning method to cure dimensionally accurate layers. The process planning method is tested by conducting a case study.

Findings

The layer cure model is found to be valid within 3 percent for most of the features and within 10 percent for very small features (<250μm). The paper shows that ray tracing can be effectively used to model the process of irradiation of the resin surface in a MPμSLA system.

Research limitations/implications

The process planning method is applicable only to those imaging systems, which are aberration limited as opposed to diffraction limited. The dimensional errors in the lateral dimensions of single layers cured by MPμSLA have been modeled, but not the vertical errors in 3D parts.

Originality/value

In this paper, a process planning method for MPμSLA has been presented for the first time.

Keywords

Citation

Limaye, A.S. and Rosen, D.W. (2007), "Process planning method for mask projection micro‐stereolithography", Rapid Prototyping Journal, Vol. 13 No. 2, pp. 76-84. https://doi.org/10.1108/13552540710736759

Publisher

:

Emerald Group Publishing Limited

Copyright © 2007, Emerald Group Publishing Limited

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