Using response surface methodology to optimize the stereolithography process

Abstract

Purpose

The purpose of this paper is to present a study of the stereolithography apparatus SLA 250‐50 motivated by the introduction of the new epoxy resin AccuGen™.

Design/methodology/approach

Several process variables are examined using a Box‐Behnken design and optimization techniques are employed to determine their optimal settings.

Findings

The results indicate operating conditions at which high levels of performance can be achieved.

Research limitations/implications

The results reported in this research are process specific, however, the methodology employed can be readily applied to different rapid prototyping processes.

Practical implications

Effective utilization of the SL process.

Originality/value

Quantitative understanding of the process capability in relation to key process variables.

Citation

Weheba, G. and Sanchez‐Marsa, A. (2006), "Using response surface methodology to optimize the stereolithography process", Rapid Prototyping Journal, Vol. 12 No. 2, pp. 72-77. https://doi.org/10.1108/13552540610652401